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<b><span style="font-size:16.0pt; color:#1F497D">Department of Electrical and Computer Engineering</span></b><span style="font-size:16.0pt; color:#1F497D"></span></p>
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<b><span style="font-size:16.0pt; color:#1F497D">Materials Engineering Program</span></b></p>
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<b><span style="font-size:14.0pt; color:#1F497D">Center for Integrated Bio and Nano Systems</span></b></p>
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<b><span style="font-size:14.0pt; color:#1F497D"> 11:00 a.m., September 4</span></b><b><span style="font-size:14.0pt; color:#1F497D"></span></b><b><span style="font-size:14.0pt; color:#1F497D">, 2020</span></b><span style="font-size:14.0pt; color:#1F497D"></span></p>
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<b><span style="font-size:14.0pt; color:#1F497D">Join Zoom Meeting</span></b><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:#1F497D"></span></p>
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<b><span style="font-size:14.0pt; color:#1F497D"><a href="https://urldefense.com/v3/__https://zoom.us/j/845619943?pwd=QlZvYUV6M2dxNDkvNWxBd3F2YzdJZz09__;!!LkSTlj0I!RY36v8rc0HmWFLiTTBHvwLA0IazEOlQxdQZC1QwuRSdYLO0ZgFA27Y6PryVryUiq6I-G0w$">https://zoom.us/j/845619943?pwd=QlZvYUV6M2dxNDkvNWxBd3F2YzdJZz09</a></span></b></p>
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<b><span style="font-size:14.0pt; color:#1F497D">Meeting ID: 845 619 943</span></b></p>
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<b><span style="font-size:14.0pt; color:#1F497D">Password: 016104 </span></b></p>
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<b><span style="font-size:20.0pt; color:#1F497D"></span></b><b><span style="font-size:20.0pt; color:#1F497D">Metal Deposition Assisted by UPD Monolayers-Methods and Applications<br>
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<span style="font-size:18.0pt; color:#1F497D">Stanko R. Brankovic</span></p>
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<span style="font-size:16.0pt; color:#1F497D">Cullen College of Engineering, University of Houston</span></p>
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<b><span style="color:#1F497D">Abstract</span></b><span style="font-size:11.0pt; font-family:"Calibri","sans-serif"; color:#1F497D">:</span><span style="color:#1F497D">
</span><span style="color:#1F497D">The improved understanding of nucleation and growth kinetics provided the base for design of new experimental approaches where the thin film growth was manipulated to enhance the evolution of atomically flat epitaxial overlayers.
Following this progress, a new protocols for electrochemical thin film growth were developed which benefit from the Underpotentially Deposited Monolayers (UPD ML) serving as a surfactants (Surfactant Mediated Growth, SMG), mediators (Defect Mediated Growth,
DMG) or sacrificial materials (Deposition via Surface Limited Redox Replacement, SLRR) in electrodeposition process of thin films. In these examples, the essential step that results in desired 2D growth mode is achieved by precise control of the electrode
potential, electrodeposition sequence and/or solution chemistry which enable particular action/benefit of the UPD ML to be fully exploited in the growth process.
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<span style="color:#1F497D">In the first part of the talk we will briefly review fundamentals of the electrochemical thin film growth assisted by UPD ML. Our results and discussion are focused on examining the extendibility of SMG, DMG and SLRR approach for
thin film growth in technologically relevant system such as Cu/Ru(hklm). The Cu/Ru(hklm) represents the overlayer/substrate system which has significant epitaxial strain (-5.5%). This fact together with room temperature growth conditions favor a 3D growth.
However, as it will be shown, with convenient use of UPD ML serving as surfactant, or mediator, or sacrificial material a 2D growth of Cu on Ru can be achieved readily.</span></p>
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<span style="color:#1F497D">In the second part of the talk we will demonstrate that UPD-like ML can be deposited on different substrates using an electroless (e-less) approach. The example of improved morphology and magnetic properties of e-lessly deposited
Co overlayers on Cu assisted by e-lessly deposited Pb ML serving as surfactant are analyzed. The phenomenon of e-less UPD-like ML deposition as a prelude for e-less atomic layer epitaxial deposition (E-less ALD) will be discussed as well. We will show results
demonstrating noble metal thin film growth on Cu and other substrates using e-lessly deposited Pb UPD-like ML serving as a reducing precursor in SLRR reaction with noble metal ions such as Pt, Pd, and Ru.
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<b><span style="color:#1F497D">Short Bio</span></b><span style="color:#1F497D">: </span>
<span style="color:#1F497D">Stanko R. Brankovic obtained B.E. in Chemical and Biochemical Engineering in 1994 from University of Belgrade and Ph.D. in Science and Engineering of Materials in 1999 from Arizona State University (Tempe, AZ). Before joining the
Electrical and Computer Engineering Department at University of Houston in 2005, he spent two years as postdoctoral research associate at Brookhaven National Laboratory (1999-2001) and four years as a research staff member at Seagate Research Center in Pittsburgh
(2001-2005). Dr. Brankovic has served as the Chair of the Electrodeposition Division of The Electrochemical Society (2017-2019) and as the chair of the Electrochemical Material Science Division of the International Society of Electrochemistry (2015-2017).
His research interests span in different areas of material and surface science including Thin Films, Corrosion, Electrocatalysis, Electrodeposition, Magnetic Materials, Nanofabrication and Sensors. His work has been acknowledged by University of Houston Research
and Excellence Award (2010) and National Science Foundation Faculty Early Career Development Award (2010). He is also recipient of the 2017 Electrodeposition Research Award of the Electrochemical Society. More information about Dr. Brankovic's group and research
interests are available at: http://ecnfg.ece.uh.edu.<br>
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